Berlin 2008 – scientific programme
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O: Fachverband Oberflächenphysik
O 66: Metallic Nanostructures I (on Metals)
O 66.10: Talk
Thursday, February 28, 2008, 15:00–15:15, MA 041
Fabrication and metallic filling of sub30nm-nanoholes by PLD — Marc Saitner, •Christian Pfahler, Achim Manzke, Alfred Plettl, and Paul Ziemann — Solid State Physics, University of Ulm, D-89069 Ulm, Germany
Gold or platinum nanoparticles with diameters between 6 and 14nm were produced using a micellar technique and H2 plasma ashing. Preparing such particles on e.g. silicon substrates, they act as a mask in subsequent anisotropic reactive ion etching with a CF4/CHF3 gas mixture. Direct processing results in nanopillars, whereas nanoholes can be created by inversion of this mask. Diameter and height of the holes are typically in the range of 10-40nm and 10-250nm, respectively. Aside from crystalline silicon it is possible to transfer the whole process directly to amorphous silicon, silicon oxide or nitride and thus to corresponding multilayer systems.
By using Pulsed Laser Deposition (PLD) these nanoholes can be filled with different metals. The influence of the substrate, the shape of the holes and the energy density of the laser will be discussed, and applications will be presented.