Berlin 2008 –
wissenschaftliches Programm
O 68: Metal Substrates: Solid-Liquid Interfaces
Donnerstag, 28. Februar 2008, 13:15–14:45, MA 043
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13:15 |
O 68.1 |
In situ STM characterisation of electrochemically prepared ultrathin copper sulfide films on Au(1 0 0) — •Christian Schlaup, Peter Broekmann, and Klaus Wandelt
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13:30 |
O 68.2 |
Electrochemical oxygen reduction at pseudomorphic Pt thin films on Ru(0001) — •Otávio B. Alves, Harry E. Hoster, and R. Jürgen Behm
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13:45 |
O 68.3 |
Additives for the copper damascene process - in-situ ECSTM and XPS studies — •Knud Gentz, Sascha Hümann, Stefan Breuer, Ralf Hunger, Klaus Wandelt, and Peter Broekmann
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14:00 |
O 68.4 |
Electrochemical Faceting of Ir(210) — Payam Kaghazchi, Khaled A. Soliman, Felice C. Simeone, Ludwig A. Kibler, and •Timo Jacob
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14:15 |
O 68.5 |
A new approach to obtain electrochemical E/pH diagrams derived from the viewpoint of semiconductor defects — •Mira Todorova and Jörg Neugebauer
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14:30 |
O 68.6 |
A Quantum Chemistry Roadmap Towards Highly Accurate Adsorption Energies at Ionic Surfaces — •Bo Li, Angelos Michaelides, and Matthias Scheffler
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