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Berlin 2008 – scientific programme

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O: Fachverband Oberflächenphysik

O 68: Metal Substrates: Solid-Liquid Interfaces

Thursday, February 28, 2008, 13:15–14:45, MA 043

13:15 O 68.1 In situ STM characterisation of electrochemically prepared ultrathin copper sulfide films on Au(1 0 0) — •Christian Schlaup, Peter Broekmann, and Klaus Wandelt
13:30 O 68.2 Electrochemical oxygen reduction at pseudomorphic Pt thin films on Ru(0001) — •Otávio B. Alves, Harry E. Hoster, and R. Jürgen Behm
13:45 O 68.3 Additives for the copper damascene process - in-situ ECSTM and XPS studies — •Knud Gentz, Sascha Hümann, Stefan Breuer, Ralf Hunger, Klaus Wandelt, and Peter Broekmann
14:00 O 68.4 Electrochemical Faceting of Ir(210)Payam Kaghazchi, Khaled A. Soliman, Felice C. Simeone, Ludwig A. Kibler, and •Timo Jacob
14:15 O 68.5 A new approach to obtain electrochemical E/pH diagrams derived from the viewpoint of semiconductor defects — •Mira Todorova and Jörg Neugebauer
14:30 O 68.6 A Quantum Chemistry Roadmap Towards Highly Accurate Adsorption Energies at Ionic Surfaces — •Bo Li, Angelos Michaelides, and Matthias Scheffler
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