Berlin 2008 – scientific programme

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O: Fachverband Oberflächenphysik

O 90: Methods: Scanning Probe Techniques II

O 90.6: Talk

Friday, February 29, 2008, 11:30–11:45, MA 042

Smoothing of surfaces by deposition of amorphous PSZ — •Johanna Röder and Hans-Ulrich Krebs — Institut für Materialphysik, Universität Göttingen, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany

Nowadays the investigation of growth characteristics is of great interest, as for many thin film technologies the surface morphology plays an important role. Especially for optical, electrical or mechanical properties it is important to control features like surface and interface roughnesses during the deposition of thin films. Up to now a lot of experimental and theoretical work has been done to investigate the roughness evolution during film growth on a smooth substrate. In this contribution another approach is chosen and the growth of films deposited on an already rough surface is investigated. Here smoothing phenomena may occur depending on the materials used. As rough substrates thin Ag-films on Si were used, which show distinct island growth and thus exhibit statistic roughness (rms of 0.9 nm). Smoothing is done by deposition of an additional amorphous layer of partially stabilized zirconium oxide (PSZ) with an rms-roughness of 0.1 nm on Si and the results were discussed with respect to the dominating smoothing mechanisms that occur during deposition. Therefore stochastic differential equations were consulted and the scaling behaviour of the roughness evolution was investigated. All samples were deposited by pulsed laser deposition and investigated via atomic force microscopy. Power spectral densities as well as autocorrelation functions were calculated.