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SYSA: Symposium Tayloring Organic Interfaces: Molecular Structures and Applications

SYSA 5: Poster Session SYSA

SYSA 5.73: Poster

Dienstag, 26. Februar 2008, 14:30–20:00, Poster A

Temperature dependence of dislocation formation in perylene films — •Phenwisa Niyamakom, Philip Schulz, Azadeh Farahzadi, Maryam Beigmohamadi, and Matthias Wuttig — Institute of Physics (IA), RWTH Aachen University, 52056 Aachen, Germany

We have recently studied the growth of highly ordered perylene thin films on top of an amorphous oxide layer at room temperature. These films show growth model, which is assisted by screw dislocation [1]. In this study, the substrate temperature is included as an important deposition parameter to investigate the temperature dependence on the evolution of dislocations in perylene films with thickness and deposition rate. The perylene films have been deposited by vacuum thermal evaporation (VTE). The film morphology and structural properties have been investigated by atomic force microscopy (AFM) and X-ray diffractometry (XRD). The surface roughness, island density and screw dislocation density have been analyzed by AFM. Our quantitative analysis also includes the determination of the lateral correlation length, extracted from AFM images. An analysis of the XRD peak profiles allowed us to determine the microstrain and vertical grain size. The comparison of the perylene thin film growth at different substrate temperatures will be presented.

[1] M. Beigmohamadi, P. Niyamakom, A. Farahzadi, S. Kremers, T. Michely and M. Wuttig, phys. stat. sol.(RRL) 2, No.1, 1-3 (2008).