Darmstadt 2008 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

P: Fachverband Plasmaphysik

P I: Poster: Staubige Plasmen, Dichte Plasmen

P I.18: Poster

Dienstag, 11. März 2008, 08:30–10:30, Poster C3

Generation of SICN nano particles in an inductively coupled plasma — •Angelo Consoli and Achim von Keudell — Arbeitsgruppe Reaktive Plasmen, Ruhr-Universität Bochum, 44780 Bochum

Particles produced in plasmas are of key interest in many applications. For example, particles with diameters smaller than 10nm will exhibit quantum effects and may serve as quantum dots or embedded in an amorphous matrix may induce photoluminescence. The combination of reactive precursor gases, such as silane, acetylene and ammonia will generate silicon carbon nitride (SiCN) particles, which cannot be produced in standard chemical equilibrium processes. SiCN is an important semiconductor with interesting physical characteristics, such as hardness, oxidation, and corrosion resistance. Particles consisting of SiCN may serve as carriers for nanodisperse catalysts or can be used in optical applications as luminescent dots. The problem however, is to tailor particles characteristics such as particle diameter and particle composition in a controlled way. We will show first results of the generation of small SiCN particles in an inductively coupled plasma. The particles will be extracted from the plasma volume by means of electric fields and deposited on a silicon wafer. This enables us to examine the particles ex-situ by means of AFM. The plasma chemistry leading to particle formation will be followed time-resolved via molecular-beam mass spectrometry.