Darmstadt 2008 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
P: Fachverband Plasmaphysik
P II: Poster: Niedertemperaturplasmen, Plasmatechnologie
P II.18: Poster
Dienstag, 11. März 2008, 11:00–13:00, Poster C3
An influence of the skin effect on plasma impedance in an inductively coupled RF discharge — •Kostyantyn Polozhiy1 and Dmytro Rafalskyi2 — 1Ruhr-Universität Bochum, Bochum, Germany — 2Kharkiv National V. Karazin University, Kharkiv, Ukraine
The phenomenological model of the plasma impedance in an inductively coupled RF discharge with cylindrical geometry is presented. The model takes into account an influence of the skin effect on a distribution of the electromagnetic fields in plasma for both cases of low- and high-density plasmas. Using an approximate formula for the electrical field distribution in the plasma bulk, an analytical solution and the basic expressions for the general electrical characteristics of the inductively coupled RF discharges are obtained. It is shown that a consideration of the plasma as a conductive loop with thickness of a skin-depth order reduces an obtained plasma impedance by factor 2. A preliminary experimental verification of the model results has been done. The results can be useful for further development of the existing models of the plasma impedance in the inductively coupled RF discharges.