Darmstadt 2008 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P II: Poster: Niedertemperaturplasmen, Plasmatechnologie

P II.22: Poster

Dienstag, 11. März 2008, 11:00–13:00, Poster C3

Pulsed Low Frequency Inductively Coupled Plasma Source — •Christian Teske, Joachim Jacoby, Waldemar Schweizer, and Jörg Wiechula — Institut für Angewandte Physik, Johann-Wolfgang-Goethe Universität, 60438 Frankfurt am Main, Germany

An inductively coupled pulsed plasma source with an operating frequency of 29kHz is introduced.Using a series resonance circuit with large diameter induction coils surrounding a spherical discharge vessel, a plasma was produced and investigated in the pressure range from 0,1Pa to 100Pa. Pulsed coil currents reached a maximum value of 9,6kA while achieving an energy coupling efficiency of 80% between the driving circuit and the plasma. Pulsed power peak values reached more than 1MW. Moreover the spectroscopic diagnostic revealed a high fraction of ionized particles and an emission spectrum in the near UV range. By using a fast shutter camera system the initiation of the discharge was investigated. The ignition of the discharge along an azimuthal path was documented, showing evidence of an inductive plasma initiation without capacitive coupling.