Dresden 2009 – scientific programme

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BP: Fachverband Biologische Physik

BP 7: Poster I

BP 7.47: Poster

Monday, March 23, 2009, 17:45–20:00, P3

Sub 300 nm Softlithography with SU8 — •Jörg Käsewieter, Jan Regtmeier, and Darius Anselmetti — Experimental Biophysics & Applied Nanoscience, Faculty of Physics, Bielefeld University, Germany

Softlithograpy is a low-cost strategy to produce micro- and nano devices. Here we demonstrate that the photoresist SU8, which is designed for thick and high aspect ratio application, can also be used to create 3D micro- and nanofluidic channels with dimensions <300 nm. In a multilayer lithography process, a sub 300 nm SU8 film is spincoated and processed, followed by a layer, which is several micron thick. The layers are aligned with a mask aligner allowing for a positioning precision better than 2 micron absolut.

The SU8 multilayers are replicated with Polydimethylsiloxane (PDMS), that is pretreated with an oxygen plasma before assembly to render the surfaces hydrophil. This combination of nano- and microfluidics allows new approaches to bioanalytical lab-on-a-chip devices, which will be discussed.