Dresden 2009 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 13: POSTERS Polymer Physics

CPP 13.14: Poster

Dienstag, 24. März 2009, 14:00–16:30, P3

Patterning of surface immobilized ATRP starter — •Sebastian G.J. Emmerling and Jochen S. Gutmann — Max Planck Institute for Polymer Research, Ackermannweg 10, D-55128 Mainz, Germany

Patterning of silanes on silicon surfaces by photolithography or electron beam lithography has become a routine technique. Photolithography however involves several steps and therefore can be time-consuming, as it is the case in electron beam lithography. In contrast to this, we have developed a method to pattern an ATRP-starter that is immobilized on a silicon surface via a silane group with the use of an inject-printer. Since the ATRP-starter (4-(Chlorodimethylsilyl)-2-methylbutan-2-yl 2-bromo-2-methylpropanoate) contains a hydrolytically labile bromoester functionality, we printed sulphuric acid to cleave the molecule at this point. The remains on the surface then contain no longer a bromo-functionality and thus are inactive in ATRP. Subsequently PMMA brushes grew then selectively in the areas, which had not been in contact with sulphuric acid. Imaging ellipsometry allowed to measure site specific the film thickness. Depending on the concentration of the plotted sulphuric acid, we were able to tune the density of starter molecules in the plotted region. Given that in ATRP all chains grow to the same length, the density determines the thickness of the produced polymer film, which we were able to observe. The advantage of this technique is that large areas can be patterned quickly in just one step, while the smallest features generated thus far were single droplets the size of 100 to 200 micrometer.