Dresden 2009 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 28: POSTERS Interfaces and Thin Films

CPP 28.22: Poster

Mittwoch, 25. März 2009, 17:00–19:00, P3

Block Copolymer Templating using Periodic Chemical Nano-Patterns Induced with the Tip of an Atomic Force Microscope — •Tobias Heiler¹, Regina Weingaertner², Vassilios Kapaklis³, Roland Groeger², Stefan Walheim¹ und Thomas Schimmel^1,2 — ¹Institute of Nanotechnology (INT), Forschungszentrum Karlsruhe, Germany — ²Institute of Applied Physics and DFG-Center for Functional Nanostructures (CFN), Universität Karlsruhe, Germany — ³present address: Engineering Science Department, University of Patras, 26504 Patras, Greece

The nanoscale phase morphology of an amphiphilic block copolymer film was controlled by a chemical periodic surface energy pattern made by molecular exchange with the tip of an Atomic Force Microscope (AFM). The two polymer components of the copolymer, as well as the two surface molecules of the chemically patterned substrate posses a high contrast in polarity, so that a defect-tolerant pattern replication with a line width of 40 nm in the polymer film is observed after a short (vapor-)annealing process. We used polyethylenoxide-polyisoprene-polyethylenoxide block copolymers and methyl- vs. carboxyl-terminated alkane thiols as self-assembled monolayers.