Dresden 2009 – wissenschaftliches Programm

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DF: Fachverband Dielektrische Festkörper

DF 6: Poster I

DF 6.11: Poster

Dienstag, 24. März 2009, 09:30–12:30, P5

Micro- and nano-patterning of lithium niobate — •Thomas Gischkat¹, Frank Schrempel¹, Holger Hartung², Ernst-Bernhard Kley², Andreas Tünnermann², and Werner Wesch¹ — ¹Institut für Festkörperphysik, Friedrich-Schiller-Universität Jena — ²Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena

In order to manipulate light on the nanoscale, the engineering and fabrication of novel photonic nanomaterials and devices (e.g. photonic crystals, micro-resonators and Bragg-gratings) using micro- and nanoscale patterning technologies is of growing interest. We report on the patterning of LiNbO₃ by means of Ion Beam Enhanced Etching (IBEE), which is based upon the fact, that the chemical resistance of the crystal is reduced due to ion irradiation induced defects. Thus the irradiated regions can be removed without affecting the non-irradiated crystal. The principle of the method is introduced and the influences of fundamental parameters like ion fluence, irradiation and etching temperature are discussed. Lateral patterning is performed by creation of a damaged- commonly amorphous - layer starting from the surface. To define the lateral geometry, masks prepared by standard lithographic processes applying photo- or electron-beam-lithography are used providing the opportunity for a selective irradiation with ions. Vertical patterning is obtained, if the damage is established as a buried layer. Actually three dimensional patterning is possible if lateral and vertical patterning is performed together. This is exemplarily shown for micro-discs and 2D-photonic crystals with underlying air gap, respectively.