Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 10: Surface Modification

DS 10.3: Vortrag

Dienstag, 24. März 2009, 11:30–11:45, GER 37

Importance of internal ionbeam parameters on the self-organized pattern formation withlow-energy broad beam ion sources — •Marina Cornejo, Bashkim Ziberi, Michael Tartz, Horst Neumann, Frank Frost, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung (IOM), Permoserstrasse 15, D-04318Leipzig, Germany

Self-organized pattern formation during low energy ion beam erosion of solid surfaces is a simple bottom-up approach for the generation of nanostructures. Using broad beam sources, large-area nanostructured surfaces can be produced in a cost-efficient single-step process. A critical parameter for the patterning with ion beams is the ion beam incidence angle. However, inherent to all broad beam sources, the ion beam exhibits a certain divergence. This generates a spread of the local incidence angle with respect to the geometrically defined beam incidence angle. Recent studies showed that the divergence angle and angular distribution of the ions, here called internal beam parameters, also affect the surface topography. In this contribution we focus on the effect of the internal beam parameters on the surface topography. It was analyzed the effect on the topography on Si surfaces of some experimental parameters that affect the internal beam parameters by changing the ion-optical parameters and the shape of the plasma sheath boundary. Explicitly, the influence of the discharge voltage, the operation time and the distance between the screen and accelerator grid is shown. Additionally, first result of quantitative measurements of divergence and angular distribution within the ion beam will be presented.