Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 10: Surface Modification

DS 10.7: Vortrag

Dienstag, 24. März 2009, 12:30–12:45, GER 37

Development strategy of new liquid metal and alloy ion sources for focussed ion beam technology — •Kirill Trunov, Paul Mazarov, Alexander Melnikov, Rüdiger Schott, and Andreas D. Wieck — Lehrstuhl für Angewandte Festkörperphysik, Ruhr-Universität Bochum, 44780 Bochum, Germany

Liquid metal ion and alloy sources (LMIS and LAIS) are widely used in focused ion beam (FIB) technology. Since many years our group develops and produces a lot of different LMIS and LAIS for micromachining and surface treatment in the submicron and nano-scales. For very successful approach to high sputter efficiency, Bi and Au ion species are employed, partially with heavy and big clusters. The development of rare-earth element LAISs (Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm) opens new applications in superconductivity, optical and magnetic material research. Silicon is n-type doped with elements from the fifth group of the periodic table (P, As, Sb, Bi) and p-type doped with elements from the third group (B, Al, Ga, In) giving the possibility of a large range of ionization energy for donors and acceptors in Si. For producing these and another LMIS and LAIS, we apply completely new methods for mechanical and chemical treatment of the sources, testing and the use in commercial FIB systems.