Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 11: Layer Growth: Evolution of Structure and Simulation
DS 11.3: Vortrag
Dienstag, 24. März 2009, 14:30–14:45, GER 37
Ion induced Burying Effect of Au Nanoparticles on SiO2: Influence of Sputtering — A. Klimmer1, M. Trautvetter1, B. Kuerbanjiang2, •P. Ziemann1, J. Biskupek2, and U. Kaiser2 — 1Universität Ulm, Institut für Festkörperphysik, D-89069 Ulm — 2Universität Ulm, ZE Elektronenmikroskopie, D-89069 Ulm
Ordered arrays of spherical Au nanoparticles (NP) exhibiting narrow size distributions were fabricated on top of SiO2 substrates applying a micellar preparation technique [1]. Ion irradiating such NP arrays of different starting diameters with 200 keV Ar+ and Xe+, respectively, leads to a burying effect until the NP are completely covered. Combining HRTEM data with AFM height measurements delivering the necessary statistics allows a quantitative analysis of the phenomenon. It will be demonstrated that in addition to the necessary thermodynamic driving forces related to an ion induced enhancement of the substrate viscosity and to the various surface and interface energies [2], sputtering of the NP with a size-dependent sputter yield has to be included in the description of the experimental results in order to improve agreement.
[1] Micellar Nanoreactors: Preparation and Characterization of Hexagonally Ordered Arrays of Metallic Nanodots, G. Kästle at al., Adv. Funct. Mater. 13, 853 (2003). [2] Burrowing of Pt nanoparticles into SiO2 during ion-beam irradiation, X. Hu, D. G. Cahill, R. S. Averback, J. Appl. Phys. 92, 3995 (2002).