Dresden 2009 – scientific programme
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DS: Fachverband Dünne Schichten
DS 13: Thin Film Metrology for Electronics, Photonics, and Photovoltaics I
DS 13.5: Talk
Tuesday, March 24, 2009, 11:45–12:00, GER 38
Metrology of nano-thin films by use of atomic force acoustic microscopy — •Malgorzata Kopycinska-Müller1,2, Andrey Striegler1,2, Arnd Hürrich3, Bernd Köhler1, Norbert Meyendorf1, and Klaus-Jürgen Wolter2 — 1Fraunhofer IZFP-D, Dresden, Germany — 2Technical University Dresden, Germany — 3Fraunhofer IPMS, Dresden, Germany
We characterized using the atomic force acoustic microscopy (AFAM) technique the mechanical properties of nano-thin films of silicon oxide grown on silicon substrate. The films thicknesses ranged from 7 nm to 28 nm, as measured by ellipsometry method. The results of AFAM measurements showed that it is possible to determine the elastic properties of the film if its thickness is known. In addition, the preliminary analysis of the AFAM results indicated that it may be possible to use the AFAM technique to determine the thickness in a thin-film system if the elastic properties of the system components are known.
AFAM is a contact based method and as such provides information on the sample effective elastic properties from a certain volume that is compressed under an AFM tip. The information on the sample stiffness is obtained from the analysis of resonant vibrations of an AFM cantilever beam.