DS 1: Thin Film Characterisation: Structure Analyse and Composition (XRD, TEM, XPS, SIMS, RBS, ...) I
Montag, 23. März 2009, 10:15–12:00, GER 37
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10:15 |
DS 1.1 |
Epitaxial growth of ZnO on CuInS2(112) — Stefan Andres, •Carsten Lehmann, and Christian Pettenkofer
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10:30 |
DS 1.2 |
Sputter deposition of vanadium pentoxide (V2O5) as electrode material in rechargable Li-ion batteries — •Tobias Gallasch, Tobias Stockhoff, and Guido Schmitz
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10:45 |
DS 1.3 |
Photoactive TiO2 Thin Films: Domination of Phase Formation or Microstructure — •Darina Manova, Jürgen Gerlach, Thomas Höche, and Stephan Mändl
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11:00 |
DS 1.4 |
Formation of Ge NC’s out of (GeOx-SiO2) superlattice structures — •Nicole M. Jeutter, Manuel Zschintzsch, Johannes von Borany, and Carsten Baehtz
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11:15 |
DS 1.5 |
Characterization of Sr-Ta-O/TiN/Si stacks by means of XPS, AES and TOF-SIMS — •Canan Baristiran Kaynak, Mindaugas Lukosius, and Christian Wenger
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11:30 |
DS 1.6 |
Characterization of the diffusion process in Al2O3 thin films based on ToF-SIMS measurements — •Pawel Piotr Michalowski, Malte Czernohorsky, Volkhard Beyer, Gert Jaschke, and Steffen Teichert
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11:45 |
DS 1.7 |
Structural and magnetic properties of CoFeB/MgO multilayers — •Kirill Zhernenkov, Miriana Vadala, Boris Toperverg, Hartmut Zabel, Hitoshi Kubota, and Shinji Yuasa
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