Dresden 2009 – scientific programme

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.14: Poster

Wednesday, March 25, 2009, 09:30–12:30, P5

Towards understanding the structure formation of dc magnetron sputtered TiO₂ thin films — •Azza Amin, Dominik Koel, and Matthias Wuttig — RWTH University, Aachen

TiO₂ thin films are applied in a wide range of applications comprising e.g. anti-bacterial coatings that utilize the excellent photocatalytic properties of the films or optical coatings where the high refractive index enables e.g. the production of highly effective AR layer stacks. The physical properties exploited for the different applications strongly depend on the crystal structure of the films. Crystalline TiO₂ thin films typically exhibit a mixture of the anatase and the rutile phase. The challenge in thin film production, therefore, is to tailor the structure composition with the aim to enhance the specific physical property needed for the targeted application. It is therefore highly desirable to develop a comprehensive understanding of the principle mechanisms that drive the nucleation of the film into the separate crystal structures. However, especially in the case of a magnetron sputter discharge, which is preferentially used in the industries large area coating tools, there is a large set of parameters determining e.g. growth velocity and energetic impact and thereby influencing structure formation. Consequently, the growth of sputtered TiO₂ thin films at the present time is only partially understood. We will present new approaches that are aimed to establish a growth model on an atomistic scale. Special emphasis is put on the investigation of the impact of energetic particles, both during the nucleation and the post-coalescence regime of film growth.