Dresden 2009 – scientific programme

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.19: Poster

Wednesday, March 25, 2009, 09:30–12:30, P5

Titanium Oxynitride films by Unfiltered Arc Deposition — •Andreas M. Zoll and Roger Thull — Lehrstuhl und Abteilung für Funktionswerkstoffe der Medizin und Zahnheilkunde, Universitätsklinikum Würzburg, Pleicherwall 2, D- 97070 Würzburg

The presented titanium onynitride films are deposited using unfiltered arc sputtering technique on polycrystalline titanium and glass surfaces. The substrate temperature varied between 130 and 160 °C.

Starting with titanium oxide films an increasing fraction of oxygen was substituted with Nitrogen. Thereby the total pressure was kept constant for all coating processes.

While the titanium oxide film consisted mainly of anatase with only a small amount of rutile, titanium oxynitride films show an increasing amount of rutile although temperature was kept at the same level. Diffraction peaks orohinating from osbornite could not be detected.

Resistance measurements by means of the four-point probe show a nearly exponential decreasing of the electric resistance in terms of the fraction of Nitrogen.

A reduction of the band gap energy could also be determined by means of photoreflectance and electroreflectance spectroscopy.