Dresden 2009 – scientific programme
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DS: Fachverband Dünne Schichten
DS 26: Poster II
DS 26.1: Poster
Wednesday, March 25, 2009, 09:30–12:30, P5
Glancing angle deposition on differently patterned substrates: influence of pattern period — •Christian Patzig1, Joachim Zajadacz1, Klaus Zimmer1, Renate Fechner1, Bodo Fuhrmann2, and Bernd Rauschenbach1 — 1Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstraße 15, 04318 Leipzig — 2Interdiszipläneres Zentrum für Materialwissenschaft, Martin-Luther-Universität Halle, Heinrich-Damerow-Straße 4, 06120 Halle
If in a physical vapour deposition process the substrate is tilted with respect to the particle source, the particle flux reaches the substrate under a highly oblique angle to the substrate normal, thus leading to self-shadowing of the particles on the substrate surface on a shadowing length l = h · tan (90∘ −β) (h... seed height, β... deposition angle). As a result, arrays of needle-like structures, slanted towards the particle flux grow, that can be tailored with a suitable substrate rotation. If the deposition is performed on patterned substrates, the template acts as an array of artificial seeds with period s, giving the possibility to grow periodically arranged nanostructures. If s ≤ l , no inter-seed- growth should occur, resulting in a layer of periodically arranged structures. Here, the growth of Si nanostructures by ion beam sputter glancing angle deposition on bare and patterned substrates will be compared, and the influence of the patterns on the growth of the structures will be discussed. Additionally, a method to overcome the geometrical restriction s ≤ l, by using a two-step lithography process will be shown. This method allows the growth of isolated structures with arbitrary periods that are independent from the shadowing length l.