Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.22: Poster

Mittwoch, 25. März 2009, 09:30–12:30, P5

Alloy Liquid Metal Ion Sources for new FIB applications — •Lothar Bischoff¹, Wolfgang Pilz¹, Paul Mazarov², and Andreas Wieck² — ¹Forschungszentrum Dresden-Rossendorf, Institut für Ionenstrahlphysik und Materialforschung,PF 510119,01314 Dresden, Germany — ²Lehrstuhl für Angewandte Festkörperphysik, Ruhr-Universität Bochum, 44780 Bochum, Germany

Recently, mass separated focused ion beams (FIB) become an increasing interest for local doping in nano-devices for optical, electrical or magnetic applications [1]. So on the basis of very stable metallic glass alloys like AuSi or AuGe with a low melting point at 365^∘C different ion sources were developed and tested due to their performance in FIB systems. In detail, Au₆₈Ge₂₂B₅Ni₅, Au₈₀Si₁₂Sb₈, Au₆₈Ge₂₈Mn₁₀ alloys were analysed concerning the on-set and emission behaviour and the mass spectra. Among clusters, molecular ions, single and doubly charged species such important ions like boron for p-doping in silicon, antimony for n-doping in silicon or manganese for quantum dot fabrication in II-VI semiconductors (CdSe, CdS, ZnS) could be extracted. [1] L. Bischoff, NIM B266 (2008) 1846.