Dresden 2009 – scientific programme
Parts | Days | Selection | Search | Downloads | Help
DS: Fachverband Dünne Schichten
DS 26: Poster II
DS 26.37: Poster
Wednesday, March 25, 2009, 09:30–12:30, P5
Transport mechanisms in magnetron sputtered transparent conducting oxide thin films: Correlating electrical properties with deposition conditions and film structure — •Michael Wassen, Dominik Köhl, and Matthias Wuttig — 1. Institute of Physics (IA), RWTH Aachen University, Germany
For industrial applications, such as the fabrication of highly efficient thin film solar cells, one of the key points is to develop transparent conducting electrodes with exceptional optical and electrical properties. Typically ITO or ZnO:Al thin films are employed for this purpose.
The influence of deposition conditions on the structure of these films has already been comprehensively investigated. An equally detailed understanding of the influence on the electrical transport properties has not been achieved as yet. Hence, the major aim of our investigation is to enhance this knowledge by developing a thorough understanding of the electrical transport properties as a function of film structure and process conditions. This goal is achieved by combining optical and electrical measurements in a wide temperature range (4K to RT) in addition with investigations of the film structure. Advanced dispersion models are utilized to describe the optical spectra in a range of 400 to 50.000 cm−1. Electrical parameters are extracted from the model parameters as well as Hall, Seebeck and van-der-Pauw measurements. These approaches lead to a comprehensive understanding of the transport mechanisms. First results are shown for ZnO:Al and ITO thin films deposited by reactive magnetron sputtering using both metallic as well as ceramic targets.