Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.42: Poster

Mittwoch, 25. März 2009, 09:30–12:30, P5

Electron Spectroscopy for Chemical Analysis of Copper Oxide thin films — •Andreas Laufer, Thomas Leichtweiß, Swen Graubner, Daniel Reppin, and Bruno K. Meyer — I. Physikalisches Institut, Justus-Liebig-Institut Giessen, Germany

The copper oxide thin films (Cu₂O and CuO) have been prepared by radio frequency sputter deposition using a sintered ceramic Cu₂O target and a metallic Cu target with oxygen as reactive gas, respectively. Electron spectroscopy for chemical analysis (ESCA) of the sputtered Cu₂O and CuO thin films was performed. In contrast to Cu₂O the (Cu) 2p photolines of CuO show satellite structures. The satellite lines are emitted with kinetic energies lowered by about 9 eV compared to the (Cu) 2p photolines. Furthermore we investigated and compared the valence band regions of the Cu₂O and CuO thin films. The quantification of the copper oxide thin films using the atomic sensitivity factors (ASF) has been done.