Dresden 2009 – scientific programme

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.43: Poster

Wednesday, March 25, 2009, 09:30–12:30, P5

Deposition of magnesium films using an anodic arc plasma source — •Oleksiy Filipov and Volker Buck — Thin Film Technology Group, Dept. of Physics, University of Duisburg-Essen, Lotharstrasse 1, 47057, Duisburg, Germany

Mg films were obtained by anodic vacuum arc technique in UHV chamber with and without hydrogen atmosphere. The films were deposited on steel substrates in order to investigate their structural properties. The variation of process parameters such as substrate bias (from 0V to 200V) and hydrogen admixture (from 0 sccm to 1000 sccm) is used to influence the film properties. The plasma parameters (electron and ion energies) were monitored during deposition by Langmuir probe, retarding field energy analyser and mass-spectrometer. The surface morphology and the grain size of the deposited films were analysed using scanning electron microscopy (SEM). The structural properties of the films were ex-situ investigated by X-ray diffraction method (XRD) and Energy dispersive X-ray spectroscopy (EDX). It is shown that the grain size in the deposited films can be varied down to 1.8 nanometers just by variation of the deposition parameters.