Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 26: Poster II
DS 26.56: Poster
Mittwoch, 25. März 2009, 09:30–12:30, P5
Electrochromic properties of WOx thin films on ZnO:Al (AZO) substrates — •Thomas Leichtweiß, Jennifer Stiebich, Angelika Polity, and Bruno K. Meyer — Justus- Liebig- Universität Gießen, I. Physikalisches Institut, Heinrich-Buff-Ring 16, 35392 Gießen
Electrochromic materials such as tungsten oxide in contact with a suitable electrolyte change their optical transmission upon the application of a potential due to ion intercalation. Technical applications include switchable mirrors and smart windows. The latter are made up of several thin-film layers containing at least one electrochromic active material and make it possible to control the light- and energy-input of a building. In such a device the electrochromic layer is deposited on top of a transparent conductive oxide film (TCO) for electrical connection.
In this work we report on the deposition of optical active tungsten oxide layers on aluminum-doped zinc oxide films by sputtering. The effect of the deposition parameters on the electrochemical and optical properties of the films is discussed and layers with optimized coloration efficiency are presented.
Non stoichiometric WOx layers have been therefore deposited by radio-frequency magnetron sputtering on aluminum-doped zinc oxide substrates. The electrochemical behavior of these films has been characterized by cyclic voltammetry and the Li+-ion chemical diffusion coefficients have been evaluated by GITT (galvanostatic intermittent titration technique). Optical spectra have been recorded in-situ when charging the layers in order to calculate their coloration efficiency.