Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.8: Poster

Mittwoch, 25. März 2009, 09:30–12:30, P5

Design and construction of a novel type of magnetron sputtering deposition system for the growth of multi-component thin films with advanced properties — •Michael Austgen, Dominik Köhl, and Matthias Wuttig — I. Institute of Physics (IA), RWTH-Aachen, D-52056 Aachen

A technical realization of a novel type of magnetron sputtering deposition system is presented, which is based on a technique known as "serial co-sputtering". The enormous advantages of this technique for the deposition of multi-component materials will be outlined. The concept of serial co-sputtering is based on the possibility of dynamic material mixing during a sputter process. Therefore the system utilizes two separate sputter cathodes, whereof at least one is a rotatable. The geometry of the system is such that the surface of the primary rotatable cathode can be doped with the material of the secondary cathode independently during the main deposition process. Therefore, serial co-sputtering allows e.g. the deposition of new and tunable binary (or even ternary, if more than one secondary cathode is utilized) compositions, which for technical reasons cannot be fabricated by standard magnetron sputtering sources. Other promising applications are the fabrication of TCOs with variable dopant concentration or sputtering with an increased deposition rate achieved by intentionally implanting adequate recoil centres into the surface of the primary target.