Dresden 2009 – scientific programme

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.9: Poster

Wednesday, March 25, 2009, 09:30–12:30, P5

Deposition and physical properties of thin TiO₂ and N-doped TiO₂ films prepared by High Power Impulse Magnetron Sputtering — •Vitezslav Stranak¹, Marion Quaas¹, Hartmut Steffen², Robert Bogdanowicz³, Harm Wulff¹, Zdenek Hubicka⁴, and Rainer Hippler¹ — ¹Institute of Physics, University of Greifswald, Greifswald, Germany — ²Leibniz Institute for Plasma Science and Technology, Greifswald, Germany — ³Gdansk University of Technology, Gdansk, Poland — ⁴Institute of Physics, Academy of Science of the Czech Republic, Prague, Czech Republic

The chemical composition, optical, photocatalytic and crystallographic properties of TiO₂ and N-doped TiO₂ thin films prepared by High Power Impulse Magnetron Sputtering are studied. The phase formation on the films -anatase, rutile or amorphous TiO₂ - is adjusted by the pressure (p ∼ 0.75 - 15 Pa) in the deposition chamber. The different crystallographic phases were determined by grazing incidence X-ray diffractometry (GIXD). XPS measurements revealed nearly stoichiometric TiO₂ composition with a small amount of incorporated N in the films. The photocatalytic activity was determined from decomposition of methylene blue. Optical parameters (n+ik, transmittance T, reflectance R and absorbance A) are measured as function of the photon energy in the UV-Vis range with spectroscopic ellipsometry (SE).