Dresden 2009 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

DS: Fachverband Dünne Schichten

DS 28: Nanoengineered Thin Films I

DS 28.5: Talk

Thursday, March 26, 2009, 10:30–10:45, GER 37

Hierarchical nano-structuring of Si surfaces by combining top-down and bottom-up techniques — •Bashkim Ziberi, Frank Frost, Jochen Zajadacz, Klaus Zimmer, Renate Fechner, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung (IOM), Permoserstrasse 15, D-04318Leipzig, Germany

Guided self-organization processes are currently in focus regarding their potential for hierarchical micrometer and nanometer scale structuring. In this regard, self-organized pattern formation due to low-energy ion beam erosion offers an alternative approach. A combination with conventional lithographic pre-patterning can lead to multi-scale structuring and an exact positioning of the nanostructures.

The principle of hierarchical nanostructuring is applied on Si surfaces during low energy Kr⁺ ion beam erosion where different micron and nanometers scale pre-patterns fabricated by e-beam lithography and laser ablation technique are used. The results show that the formation of nanostructures depends strongly on the local incidence angle of ions, the orientation of the local surface with respect to the ion beam and the local surface curvature. Depending on these parameters and on the ion beam parameters different patterns like curved ripples, ripples with different orientations and perfectly squared dots form on the surface at exact defined positions. It is demonstrated that by combination of conventional lithography techniques with ion beam induced self-organization a hierarchical nanostructing with potential applications in micro- and nanooptics is possible.