DS 28: Nanoengineered Thin Films I
Donnerstag, 26. März 2009, 09:30–11:00, GER 37
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09:30 |
DS 28.1 |
Magnetic properties of ion beam induced ripple pattered Fe layers — •Felix Büttner, Hans Hofsäss, and Kun Zhang
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09:45 |
DS 28.2 |
Transient electrical conductivity of W-based deposits during growth, relaxation and exposure to air — •Fabrizio Porrati, Roland Sachser, and Michael Huth
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10:00 |
DS 28.3 |
Development of α-(Alx,Cr1−x)2O3 solid solution strengthened thin films by reactive magnetron sputtering — •Dominic Diechle, Michael Stüber, Harald Leiste, and Sven Ulrich
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10:15 |
DS 28.4 |
Reactive Magnetron Sputtering of (GeOx-SiO2) Superlattices for Nanocrystal Synthesis — •Manuel Zschintzsch, Nicole M. Jeutter, Johannes von Borany, and Arndt Mücklich
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10:30 |
DS 28.5 |
Hierarchical nano-structuring of Si surfaces by combining top-down and bottom-up techniques — •Bashkim Ziberi, Frank Frost, Jochen Zajadacz, Klaus Zimmer, Renate Fechner, and Bernd Rauschenbach
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10:45 |
DS 28.6 |
A novel nanocomposite thin film deposition tool using plasma processes — •Ralph Schmittgens, Marcus Wolf, and Eberhard Schultheiss
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