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DS: Fachverband Dünne Schichten
DS 3: Layer Deposition Processes
DS 3.4: Vortrag
Montag, 23. März 2009, 16:30–16:45, GER 37
Sputtering of TiO2 under PEM-control — •Dieter Mergel, Farhad Mohtascham, and Özgür Aktas — Universität Duisburg-Essen, FB Physik, 47048 Duisburg
16 layers of TiO(2) have been deposited by sputtering from a metallic target. Three process parameters have been varied:
* deposition temperature (ambient or 300∘C),
* O(2)-admixture to Ar (3
* plasma excitation (DC or RF).
In every run, a glass and a silicon substrate were coated simultaneously. The process was controlled by a plasma-emission monitor of the Ti-line, whose sensitivity had been gauged by systematic experiments beforehand.
On every sample, the packing density and the intensity of the Raman anatase line was determined and related to the deposition conditions.
The reproducibility of the process was improved before this deposition series and was tested by depositing two layers on two glass substrates in the same run.