Dresden 2009 –
wissenschaftliches Programm
DS 3: Layer Deposition Processes
Montag, 23. März 2009, 15:45–17:15, GER 37
 |
15:45 |
DS 3.1 |
Growth of carbon nanotubes on different support/catalyst systems for interconnect and sensor applications — •Sascha Hermann, Ramona Ecke, Barbara Pahl, and Stefan E. Schulz
|
|
|
|
16:00 |
DS 3.2 |
Vapor--liquid--solid growth of silicon on glass — •Robert Heimburger, Nils Deßmann, Thomas Teubner, Rainald Mientus, and Torsten Boeck
|
|
|
|
16:15 |
DS 3.3 |
Epitaxial Growth of Ni on Si(100) Substrate by DC Magnetron Sputtering — •Wolfgang Kreuzpaintner, Michael Störmer, Dieter Lott, Danica Solina, and Andreas Schreyer
|
|
|
|
16:30 |
DS 3.4 |
Sputtering of TiO2 under PEM-control — •Dieter Mergel, Farhad Mohtascham, and Özgür Aktas
|
|
|
|
16:45 |
DS 3.5 |
Process Conditions for Atomic Layer Deposition of HfO2 from Alkylamides and Consequences for Reactor Design — •Thomas Zilbauer, Torsten Sulima, and Ignaz Eisele
|
|
|
|
17:00 |
DS 3.6 |
Preparation of thin biaxial strained functional oxides and multilayers — •Sascha Trommler, Thomas Freudenberg, Ruben Hühne, Bernhard Holzapfel, and Ludwig Schultz
|
|
|
