Dresden 2009 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

MA: Fachverband Magnetismus

MA 13: Poster Ia: Electron Theory (1); Magnetic Imaging (2,3); Thin Films (4-25); MSMA (26-33); Magn. Semiconductors (34-42); Magn. Half Metals and Oxides (43-60)

MA 13.3: Poster

Dienstag, 24. März 2009, 10:15–13:00, P1A

A New UHV Operating Scanning X-Ray Microscope at BESSY, Berlin — •Markus Weigand¹, Kai Fauth², Eberhard Goering¹, Christian Wolter¹, Brigitte Baretzky¹, Marcel Mayer¹, Corinne Grévent¹, Rolf Follath³, and Christian Jung³ — ¹MPI f. Metallforschung, Stuttgart — ²Uni Würzburg — ³Bessy, Berlin

Based on the proven principle of the ALS STX microscope a new scanning soft x-ray microscope has been further developed in cooperation with ACCEL GmbH opening new frontiers in x-ray microscopy.

This microscope is constructed to work in transmission, total electron yield, as well as in reflection mode. In contrast to STXMs available up to now, not only the conventional helium mode, but also UHV operation is possible. In this configuration a UHV transfer and load lock system connects the SXM with a UHV sample preparation chamber.

A main focus of the instrument is static and dynamic XMCD imaging. For this purpose, several dedicated sample holders, one of them motorized rotatable, can be used together with an adjustable magnet system, allowing to apply magnetic fields of +/-0,4T in and out of plane.

The machine will be installed at a new APPLE II-type undulator beamline at BESSY. This SXM will also be available for external users. The development of Fresnel Zone Plates, for improving the lateral resolution, based on the concept of Atomic Layer Deposition, is in progress.