Dresden 2009 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

MA: Fachverband Magnetismus

MA 13: Poster Ia: Electron Theory (1); Magnetic Imaging (2,3); Thin Films (4-25); MSMA (26-33); Magn. Semiconductors (34-42); Magn. Half Metals and Oxides (43-60)

MA 13.9: Poster

Tuesday, March 24, 2009, 10:15–13:00, P1A

Growth of epitaxial CaRuO₃ films — •Markus Wissinger^1,2, Dirk Fuchs¹, Rainer Fromknecht¹, Rudolf Schneider¹, and Hilbert v.Löhneysen^1,2 — ¹Institut für Festkörperphysik, Forschungszentrum Karlsruhe, Postfach 3640, 76021 Karlsruhe, Germany — ²Universität Karlsruhe, 76128 Karlsruhe, Germany

In this work we report on the growth of CaRuO₃ films by the pulsed laser deposition (PLD) technique. The films were deposited from stoichiometric targets which were produced by standard solid state reaction. Powder X-ray diffraction (XRD) demonstrated the impurity free orthorhombic Pbnm structure of the targets. The films were grown on (001) oriented (LaAlO₃)_0.3(SrAl_0.5Ta_0.5O₃)_0.7 and (110) NdGaO₃ single crystal substrates. The growth mode and film thickness were studied by in-situ reflection high energy electron diffraction. The composition of the films was checked by electron dispersive x-ray analysis and Rutherford backscattering spectrometry. The substrate temperature, Ts, the oxygen partial pressure, P(O2), and the target-substrate distance, d, were optimized with respect to the crystallinity of the films. The mosaic spread of the films and the of-plane lattice constant were determined from rocking curves and θ / 2 θ scans on 00l reflections, respectively.