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MA: Fachverband Magnetismus

MA 14: Poster Ib: Magnetic Materials (1-14); Micro Magnetism/Computational Mag. (15-17); Surface Magnetism (18-22); Spin Structures/Phase Transitions (23-25)

MA 14.2: Poster

Dienstag, 24. März 2009, 10:15–13:00, P1B

Hard X-ray Photoelectron Spectroscopy of Complex Materials — •Siham Ouardi, Andrei Gloskovskii, Benjamin Balke, Gerhard H. Fecher, and Claudia Felser — Institute of Inorganic and Analytical Chemistry, Johannes Gutenberg - University, 55099 Mainz

This work reports on Hard X-ray Photoelectron Spectroscopy of complex materials excited by photons of about 5.9 keV energy. The measurements were performed on Heusler thin films coated by MgO and SiO_x insulating interlayer with different thickness z from 1 nm to 20 nm. It is shown that the insulating layer does not affect the high energy spectra of the Heusler compound close to the Fermi energy. The spectra of the buried thin films agree well with previous measurements from bulk samples. The high resolution measurements of the valence band close to the Fermi energy indicate a very large inelastic electron mean free path of the electrons in the insulating layer.

The authors gratefully acknowledge financial support by the DfG (Research Unit 559).