Dresden 2009 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 25: Micro- and Nanostructured Magnetic Materials II
MA 25.13: Vortrag
Mittwoch, 25. März 2009, 18:00–18:15, HSZ 403
Microresonator fabrication for lower sensitivity limit for ferromagnetic resonance measurements — •Anja Banholzer1, Ryszard Narkowicz2, Sven Stienen1, Jürgen Lindner1, Dieter Suter2, and Michael Farle1 — 1Universität Duisburg-Essen, Standort Duisburg, Institut für Physik und CeNIDE, AG Farle, Lotharstr. 1, 47048 Duisburg — 2Universität Dortmund, Institut für Physik, Otto-Hahn-Str. 4, 44227 Dortmund
By measuring Ferromagnetic Resonance (FMR) there is a minimum number of spins which can be detected, depending on the measurement device used. We are currently developing a microresonator from which higher sensitivity can be expected. Therefore, it would be possible to measure FMR even for a small amount of sample material. We process the microresonator using Electron Beam Lithography on Silicon. For the measurement we use an external magnetic field, while the microwave field is generated inside the microresonator. The frequency of the microwave depends on the layout of the microresonator. By varying the layout, it is possible to optimise the quality factor and the signal to noise ratio. Our test measurements are performed on Permalloy nanostructures.