Dresden 2009 – scientific programme
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MA: Fachverband Magnetismus
MA 25: Micro- and Nanostructured Magnetic Materials II
MA 25.14: Talk
Wednesday, March 25, 2009, 18:15–18:30, HSZ 403
Local setting of magnetic anisotropy in FeCoSiB thin films by means of indirect ion implantation — •Norbert Martin1, Jeffrey McCord1, Andreas Gerber2, Thomas Strache3, Thomas Gemming1, Ingolf Mönch1, Rudolf Schäfer1, Jürgen Fassbender3, Eckhard Quandt2, and Ludwig Schultz1 — 1Leibniz Institute for Solid State and Materials Research IFW Dresden, P.O. Box 270116, 01171 Dresden, Germany — 2Chair for Inorganic Functional Materials, CAU Kiel, Kaiserstrasse 2, 24143 Kiel, Germany — 3Forschungszentrum Dresden Rossendorf e.V., P.O. Box 510119, 01314 Dresden, Germany
The magnetic anisotropy direction and strength of amorphous FeCoSiB thin films was modified locally by masked ion implantation without alteration of the magnetic material's structure and the intrinsic magnetic properties of the ferromagnetic film. The changes were introduced by local ion implantation in a SiO2 covering and protection layer, inducing additional stress-induced magnetic anisotropy to the magnetostrictive ferromagnetic layer. Hybrid hysteresis curves combining switching and rotational processes were measured and the underlying local variation of magnetic anisotropy was confirmed by magnetic domain observations. A good agreement between the calculated stress distribution and the experimentally obtained magnetic data was found. The described indirect method, relying purely on magneto-elastics, introduces a new path to the creation or alteration of magnetic properties subsequent to magnetic film preparation in structured magnetic samples without introducing any structural changes to the ferromagnetic layers.