Dresden 2009 – scientific programme
Parts | Days | Selection | Search | Downloads | Help
MA: Fachverband Magnetismus
MA 40: Poster II: Bio- and Molecular Magnetism (1-9); Magnetic Coupling Phenomena/Exchange Bias (10-15); Magnetic Particlicles and Clusters (16-29); Micro and Nanostructured Magnetic Materials (30-51); Multiferroics (52-64); Spin Injection in Heterostructures (65-67); Spin-Dyn./Spin-Torque (68-93); Spindependent Transport (94-108)
MA 40.11: Poster
Friday, March 27, 2009, 11:00–14:00, P1A
Modification of the magnetostatic coupling in NiFe/Au/Co/Au multilayers by He-ion bombardment through a nanosphere mask — •Oliver Buhl1, Dieter Engel1, Tanja Weis1, Arno Ehresmann1, W. Glapka2, Piotr Kuswik2, Maciej Urbaniak2, M. Blaszczyk2, Bogdan Szymanski2, Feliks Stobiecki2, Iosif Sveklo3, Andrzej Maziewski3, and K. Joszwiak4 — 1Department of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Str. 40, 34132 Kassel, Germany — 2Institute of Physics, Polish Academy of Sciences, Poznań, Poland — 3Faculty of Physics, University of Białystok, Poland — 4Poznań University of Technology, Institute of Materials Science, Poznań, Poland
He-ion bombardment through a nanosphere mask enables locally a defined modification of the magnetostatic coupling between the NiFe and the Co layers. A single layer of polystyrene nanospheres arranged in a regular hexagonal lattice on top of the layer system can be used as a lithography mask in combination with keV-He-ion bombardment, resulting in local anisotropy reductions around the spheres. This could be visualized by a regular artificially created domain structure with hexagonal symmetry, observed when a perpendicular-to-plane magnetic field of a certain value has been applied [1]. First results of VSM and MFM measurements will be presented.
[1] W. Glapka, P. Kuświk, I. Sveklo, M. Urbaniak, K. Jóźwiak, T. Weis, D. Engel, A. Ehresmann, M. Błaszczyk, B. Szymański, A. Maziewski, F. Stobiecki, Acta. Phys. Pol., (2008) at press