Dresden 2009 – scientific programme
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MM: Fachverband Metall- und Materialphysik
MM 35: Poster Session II
MM 35.17: Poster
Wednesday, March 25, 2009, 16:30–18:30, P4
Surface topography evolution during ion beam sputtering of Cu — •Maria Lenius1, Reiner Mönig2, and Cynthia A. Volkert1 — 1Institut für Materialphysik, Georg-August-Universität Göttingen — 2Institut für Materialforschung II, Forschungszentrum Karlsruhe
Ion beam sputtered surfaces develop complex patterns that are controlled by the interplay of various mechanisms such as surface diffusion, surface energy minimization, and shadowing effects. The pattern evolution is not fully understood, particularly in crystalline materials where literature investigations on low index Cu surfaces have revealed the importance of crystal orientation in addition to temperature, ion flux and dose.
In this study, the sputter erosion profiles of Cu grains with different crystal orientations have been investigated as a function of 30 keV Ga ion beam incidence and dose in a focused ion beam microscope. The resulting patterns (ripples, 'leaf' structure, or craters with length scales from 10 nm to 1 um) were characterized using SEM, AFM, and EBSD and depend on both crystal orientation and ion beam incidence. A comparison with the faceted structures of thermally annealed Cu surfaces will be performed to understand the role of surface energy on pattern formation. The final goal is to understand which mechanisms control pattern evolution at sputtered crystal surfaces.