Dresden 2009 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 35: Poster Session II

MM 35.31: Poster

Mittwoch, 25. März 2009, 16:30–18:30, P4

Patterning graphene by electron-assisted local oxidation nano-lithography — •Danny Haberer, Thomas Mühl, Mark H. Rümmeli, and Bernd Büchner — Leibniz Institute for Solid State and Materials Research (IFW) Dresden, P.O. Box 270116, D-01171 Dresden, Germany

The research interest in graphene, a single layer of graphite, is mainly driven by its remarkable electronic properties as well as its recent experimental success. Of the various routes for graphene device fabrication, oxygen plasma etching is a successful technique to apply arbitrary designs to this material. We have recently developed a route through which carbon-based materials can be patterned on the nm-scale by electro-oxidation using a scanning electron microscope with the assistance of water vapor (10 to 100 Pa). We show this method can pattern graphene without the need for an additional lithography step as is necessary with plasma etching. Further, we show the patterning of free-standing graphene membranes, which is far more challenging using conventional etching techniques.