Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
MM: Fachverband Metall- und Materialphysik
MM 47: Liquid and Amorphous Metals III
MM 47.1: Vortrag
Freitag, 27. März 2009, 10:15–10:30, IFW A
On physical properties and the atomic structure of Al-Pd alloys — •Nan Jiang, Jan Rauchhaupt, and Peter Häussler — Chemnitz University of Technology, Institute of Physics, 09107 Chemnitz
In recent years we reported on an electronic influence on phase stability of Al-3d-TM alloys (TM: Sc, …, Cu). The electronic influence is based on an internal exchange of momentum between global subsystems, namely the electronic system and the forming static structure. Both systems come into resonance to each other. The resonance is enhanced by a hybridization effect between the Al-p- and the empty TM-d-states causing a reduced effective electron density of the total system. Structure formation, phase stability and the evolution of electronic transport properties were found to be strongly related. In the present contribution we start to replace systematically the 3d-TM elements by the 4d-TM.
For thin films of amorphous Al-Pd alloys, deposited in situ at about 4 K, the resistivity and the thermopower are measured from 4 K to 350 K, the atomic structure after annealing to 350K. By comparing the strongest diffraction ring at Kpe with 2kF, the Fermi-sphere diameter, stabilizing resonances are detected, indicating two stable regions, one at around Al66.7Pd33.3, where a hybridization effect seems to be most prominent, and another one around Al40Pd60 without hybridization.