Dresden 2009 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 27: Poster Session I (Methods: Scanning probe techniques; Methods: Atomic and electronic structure; Methods: Molecular simulations and statistical mechanics; Oxides and Insulators: Clean surfaces; Oxides and Insulators: Adsorption; Oxides and Insulators: Epitaxy and growth; Semiconductor substrates: Clean surfaces; Semiconductor substrates: Epitaxy and growth; Semiconductor substrates: Adsorption; Nano- optics of metallic and semiconducting nanostructures; Electronic structure; Methods: Electronic structure theory; Methods: other (experimental); Methods: other (theory); Solutions on surfaces; Epitaxial Graphene; Surface oder interface magnetism; Phase transitions; Time-resolved spectroscopies)
O 27.110: Poster
Dienstag, 24. März 2009, 18:30–21:00, P2
Time-resolved spectroscopy beyond optical wavelengths — Robert Carley1, •Kristian Döbrich1, Cornelius Gahl1, Martin Teichmann1, Kai Godehusen2, Olaf Schwarzkopf2, Philippe Wernet2, Frank Noack1, and Martin Weinelt1,3 — 1Max-Born-Institut, Max-Born-Straße 2a, 12489 Berlin — 2Helmholtz-Zentrum für Materalien und Energie, Elektronenspeicherring BESSY II, Albert-Einstein-Str. 15, 12489 Berlin — 3Fachbereich Physik der Freien Universität Berlin, Arnimallee 14, 14195 Berlin
We are presenting characterization results of our newly developed high-order harmonics XUV source. The beamline will be used to perform time-resolved studies of metal- and semiconductor surfaces.
We use a commercial amplified Ti:Sapphire laser system generating 30 fs pulses at 20 kHz repetition rate. The beam is focused into an argon-filled gas cell to create high-order harmonics. Following separation from the IR with a thin Al filter, the XUV wavelength can be selected using a toroidal grating monochromator. Current efforts are the optimization for an energy resolution of 100 meV and a time resolution below 100 fs.
This beamline is a joint project between MBI and BESSY and will be open as a user facility to external users.