Dresden 2009 – scientific programme

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O: Fachverband Oberflächenphysik

O 27: Poster Session I (Methods: Scanning probe techniques; Methods: Atomic and electronic structure; Methods: Molecular simulations and statistical mechanics; Oxides and Insulators: Clean surfaces; Oxides and Insulators: Adsorption; Oxides and Insulators: Epitaxy and growth; Semiconductor substrates: Clean surfaces; Semiconductor substrates: Epitaxy and growth; Semiconductor substrates: Adsorption; Nano- optics of metallic and semiconducting nanostructures; Electronic structure; Methods: Electronic structure theory; Methods: other (experimental); Methods: other (theory); Solutions on surfaces; Epitaxial Graphene; Surface oder interface magnetism; Phase transitions; Time-resolved spectroscopies)

O 27.28: Poster

Tuesday, March 24, 2009, 18:30–21:00, P2

Ar gas discharge lamp with heated LiF window: A monochromatized light source for photoemission — Michael Budke, •Alexander Wittkowski, and Markus Donath — Westfälische Wilhelms-Universität Münster, 48149 Münster, Deutschland

We present a simple, inexpensive, and highly effective method for monochromatizing the vacuum ultraviolet light emitted from an Ar gas discharge for use, e.g., in photoemission experiments [1]. By using a slightly heated window of LiF acting as low-pass filter, the emission spectrum of the Ar gas discharge is reduced to the Ar line at 11.62 eV (106.7 nm). The performance of the low-pass filter is demonstrated by photoemission measurements on Cu(111). Furthermore, we compare our light source with an unmonochromatized He gas discharge, which represents the most widely used laboratory photon source in photoemission.

[1] M. Budke and M. Donath, Appl. Phys. Lett. 92, 231918 (2008)