Dresden 2009 – scientific programme
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O: Fachverband Oberflächenphysik
O 27: Poster Session I (Methods: Scanning probe techniques; Methods: Atomic and electronic structure; Methods: Molecular simulations and statistical mechanics; Oxides and Insulators: Clean surfaces; Oxides and Insulators: Adsorption; Oxides and Insulators: Epitaxy and growth; Semiconductor substrates: Clean surfaces; Semiconductor substrates: Epitaxy and growth; Semiconductor substrates: Adsorption; Nano- optics of metallic and semiconducting nanostructures; Electronic structure; Methods: Electronic structure theory; Methods: other (experimental); Methods: other (theory); Solutions on surfaces; Epitaxial Graphene; Surface oder interface magnetism; Phase transitions; Time-resolved spectroscopies)
O 27.32: Poster
Tuesday, March 24, 2009, 18:30–21:00, P2
Liquid Interface Scattering Apparatus (LISA) for Petra III: Stability and Characterization — •Christian Koops1, Bridget Murphy1, Matthias Greve1, Annika Elsen1, Jochim Stettner1, Oliver Seeck2, and Olaf Magnussen1 — 1IEAP, Christian-Albrechts-Universität zu Kiel, D-24098 Kiel, Germany — 2PETRA III at DESY, Notkestr. 85, D-22603 Hamburg, Germany
The study of liquid - liquid interfaces by x-ray scattering methods requires special diffractometers, capable of tilting the beam at precise angles down onto the interface. We have developed a new, dedicated instrument, the liquid interface scattering apparatus (LISA) for the High Resolution Diffraction Beamline at PETRA III. By means of a non-dispersive tilting double crystal monochromator this diffractometer will allow reflectivity measurements without moving the sample. The planned instrument will operate in the energy range from 6.4 keV to 30 keV and provide access in momentum space out to qz = 2.5 Å−1 . For monitoring and calibration the high-precision x-ray optics employed for beam tilting a novel optical position detection system was developed. This alignment aid system consists of small lasers and position sensitive diodes, capable of detecting movements in the submicron range during operation. Results on the diffractometer characterization by this optical system will be described.
The work is supported by BMBF-05-KS7KF3