Dresden 2009 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 29: Nanostructures at surfaces: preparation
O 29.5: Vortrag
Mittwoch, 25. März 2009, 11:30–11:45, SCH A01
Lithographic Fabrication of Clean Iron Nanostructures via Electron-Beam Induced Deposition in UHV — •Thomas Lukasczyk1,2, Michael Schirmer1,2, Marie-Madeleine Walz1,2, Florian Vollnhals1,2, Hans-Peter Steinrück1,2, and Hubertus Marbach1,2 — 1Lehrstuhl für Physikalische Chemie II — 2Interdisciplinary Center for Molecular Materials (ICMM), Universität Erlangen-Nürnberg, Egerlandstr. 3, D-91058 Erlangen
The generation of nanostructures with arbitrary shapes and well defined chemical composition is still a challenge. One approach is the technique of electron-beam induced deposition (EBID) in which a highly focused electron-beam is used to locally crack, e.g. metal containing, precursor molecules, resulting in the deposition of the non-volatile fragments. Up to now, virtually all experiments were performed in high vacuum environments, resulting in a typical metal content of the EBID deposits of 15% to 60%. By utilizing an ultra-high vacuum system, we achieved an iron purity of at least up to 95% with the precursor iron pentacarbonyl (Fe(CO)5) [1]. The purity and morphology of the deposits is strongly influenced by the surface quality and by the sample temperature. The findings discussed in the work at hand represent a route towards the lithographic fabrication of metallic nanostructures (< 20 nm) with arbitrary shapes and high purity as well as the large scale generation of iron clusters (< 10 nm) with controlled cluster density and an extremely narrow size distribution. This work was supported by the DFG under grant MA 4246/1-1.
T. Lukasczyk, et al., Small 4(6) (2008) 841.