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O: Fachverband Oberflächenphysik

O 40: Methods: Scanning probe techniques I

O 40.7: Vortrag

Mittwoch, 25. März 2009, 16:30–16:45, SCH A316

Intrinsic and extrinsic corrugation of monolayer graphene deposited on SiO₂ — •Viktor Geringer¹, Marcus Liebmann¹, Tim Echtermeyer², Sven Runte¹, Matthias Schmidt¹, Reinhard Rückamp¹, Max Lemme², and Markus Morgenstern¹ — ¹II. Physikalisches Institut, RWTH Aachen and JARA-FIT, Otto- Blumenthal-Straße, 52074 Aachen — ²Advanced Microelectronic Center Aachen (AMICA), Otto-Blumenthal-Straße 25, 52074 Aachen

Using scanning tunneling microscopy (STM) in ultra high vacuum and atomic force microscopy, we investigate the corrugation of graphene flakes deposited by exfoliation on a Si/SiO₂ surface. While the corrugation on SiO₂ is long-range with a correlation length of about 25 nm, some of the graphene monolayers exhibit an additional corrugation with a preferential wave length of about 15 nm. A detailed analysis shows that the long range corrugation of the substrate is also visible on graphene, but with a reduced amplitude, leading to the conclusion that the graphene is partly freely suspended between hills of the substrate. Thus, the intrinsic rippling observed previously on artificially suspended graphene can exist as well, if graphene is deposited on SiO₂ [1].

J. C. Meyer, A. K. Geim, M. I. Katsnelson, K. S. Novoselov, T. J. Booth, and S. Roth, Nature 446, 60 (2007).