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O: Fachverband Oberflächenphysik
O 42: Poster Session II (Nanostructures at surfaces: arrays; Nanostructures at surfaces: Dots, particles, clusters; Nanostructures at surfaces: Other; Nanostructures at surfaces: Wires, tubes; Metal substrates: Adsorption of O and/or H; Metal substrates: Clean surfaces; Metal substrates: Adsorption of organic/bio moledules; Metal substrates: Solid-liquid interfaces; Metal substrates: Adsorption of inorganic molecules; Metal substrates: Epitaxy and growth; Heterogeneous catalysis; Surface chemical reactions; Ab-initio approaches to excitations in condensed matter; Organic, polymeric, biomolecular films– also with adsorbates; Particles and clusters)
O 42.124: Poster
Mittwoch, 25. März 2009, 17:45–20:30, P2
Photochromic silver nanoparticles fabricated by nanosphere lithography — •Melanie Meixner, Alexander Sprafke, Florian Hallermann, Maximilian Reismann, Matthias Wuttig, and Gero von Plessen — Institute of Physics (IA), RWTH Aachen University, 52056 Aachen, Germany
Photochromic materials change their color under irradiation with light. In previous work [1], we have studied the photochromic transformation of silver nanoparticles embedded in transition-metal oxides prepared by dc-sputter deposition, such as TiOx, ZrOx and HfOx. The silver nanoparticles are highly inhomogeneous in shape, size and spatial distribution. The photochromic effect is based on spectral hole burning in the inhomogeneously broadened particle-plasmon band. This hole burning is probably caused by photoemission of electrons from the resonantly excited particles.
In the present work, we show that TiOx-embedded silver nanoparticles with improved photochromic properties can be fabricated through a combination of electron-beam evaporation and nanosphere lithography. Nanosphere lithography is a method to produce hexagonal arranged and equally shaped particles [2]. The good reproducibility of this approach allows us to analyze the photochromic transformation in a more quantitative way than was possible with samples prepared by sputter deposition.
[1] C. Dahmen et al., Appl. Phys. Lett. 88 ,011923 (2006)
[2] J. C. Hulteen et al., J Vac Sci Technol A 13 pp. 1553-1558 (1995)