Dresden 2009 – scientific programme
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O: Fachverband Oberflächenphysik
O 42: Poster Session II (Nanostructures at surfaces: arrays; Nanostructures at surfaces: Dots, particles, clusters; Nanostructures at surfaces: Other; Nanostructures at surfaces: Wires, tubes; Metal substrates: Adsorption of O and/or H; Metal substrates: Clean surfaces; Metal substrates: Adsorption of organic/bio moledules; Metal substrates: Solid-liquid interfaces; Metal substrates: Adsorption of inorganic molecules; Metal substrates: Epitaxy and growth; Heterogeneous catalysis; Surface chemical reactions; Ab-initio approaches to excitations in condensed matter; Organic, polymeric, biomolecular films– also with adsorbates; Particles and clusters)
O 42.15: Poster
Wednesday, March 25, 2009, 17:45–20:30, P2
Topography dependent distribution of Ag on Si surfaces during surfactant sputtering — •Taha Yasseri1, Kun Zhang2, Hans Hofsäss2, and Reiner Kree1 — 1Institute for Theoretical Physics, University of Göttingen, Friedrich-Hund Platz 1, D-37077 Göttingen, Germany. — 22nd Institute of Physics, University of Göttingen, Friedrich-Hund-Platz 1, D-37077 Göttingen, Germany.
Surface pattern formation by ion beam sputtering (IBS) can be modified by a mono layer steady-state coverage of surfactant atoms during the erosion (Surfactant Sputtering). An experimental set-up which allows a systematic study of this effect for various substrates and surfactants has been recently realized by us. Meanwhile we also extended a continuum theory and a Monte Carlo model to include surfactant effects, which makes it possible to compare experimental and theoretical findings.
Here, we present the case study of a Si substrate irradiated by 5keV Xe ions and Ag surfactants. We discuss the distribution of Ag atoms on the structured (rippled) Si surface using SEM and AFM imaging, MC data and numerical solutions of the continuum theory. We find that Ag is clustering preferentially on the crests of ripples, in accordance with a simple physical picture.