Dresden 2009 – scientific programme
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O: Fachverband Oberflächenphysik
O 42: Poster Session II (Nanostructures at surfaces: arrays; Nanostructures at surfaces: Dots, particles, clusters; Nanostructures at surfaces: Other; Nanostructures at surfaces: Wires, tubes; Metal substrates: Adsorption of O and/or H; Metal substrates: Clean surfaces; Metal substrates: Adsorption of organic/bio moledules; Metal substrates: Solid-liquid interfaces; Metal substrates: Adsorption of inorganic molecules; Metal substrates: Epitaxy and growth; Heterogeneous catalysis; Surface chemical reactions; Ab-initio approaches to excitations in condensed matter; Organic, polymeric, biomolecular films– also with adsorbates; Particles and clusters)
O 42.19: Poster
Wednesday, March 25, 2009, 17:45–20:30, P2
Electron beam induced deposition: How to use an electron beam as a pen and precursor molecules as ink to write nanopatterns — Michael Schirmer1,2, Marie-Madeleine Walz1,2, Thomas Lukasczyk1,2, Florian Vollnhals1,2, Hans-Peter Steinrück1,2, and •Hubertus Marbach1,2 — 1Lehrstuhl für Physikalische Chemie II — 2Interdisciplinary Center for Molecular Materials (ICMM), Universität Erlangen-Nürnberg, Egerlandstr. 3, D-91058 Erlangen
The fabrication of chemically and structurally well-defined nanostructures is still a challenge and important for a large number of envisioned technological applications. We explore the technique of electron-beam induced deposition (EBID) to realize the engineering of such nanostructures: By exploiting a highly focused electron-beam of a scanning electron microscope (SEM) we directly write nanostructures by locally dissociating adsorbed precursor molecules. In contrast to previous studies our novel approach is to work in an ultra high vacuum (UHV) environment. This allows us to overcome the hitherto existing limitation concerning the rather poor cleanliness of the deposits [1]. In this work, we present the successful generation of clean metallic (Fe) and oxidic nanostructures (TiOx, FeOx) with lithographically controlled shapes and lateral dimensions partially smaller than 10 nm on different substrates. The concept of EBID, basic physical principles and the promising perspectives and applications of this nanostructuring tool will be presented. This work was supported by the DFG under grant MA 4246/1-1.[1] T. Lukasczyk, et al., Small 4(6) (2008) 841.