Dresden 2009 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 56: Metal substrates: Epitaxy, growth and adsorbates

O 56.15: Vortrag

Donnerstag, 26. März 2009, 18:30–18:45, SCH A316

In-situ X-ray Study of the Oxidation of vicinal NiAl(671) — •Claus Ellinger, Vedran Vonk, Navid Khorshidi, Andreas Stierle, and Helmut Dosch — Max-Planck-Institut für Metallforschung, Heisenbergstr. 3, D-70569 Stuttgart

Vicinal surfaces with a regular stepped pattern are used to tailor the growth of oxide films or other epitaxial grown materials. In order to study the role of surface steps and kinks on the oxidation behaviour we investigated a vicinal NiAl(6,7,1) surface consisting of (110) terraces. It was chosen as the flat, oxidized NiAl(110) serves as important template for model catalysts and a tailoring of the ultra-thin alumina film would open new ways for the growth of nano particles or nanowires. In the presented surface x-ray diffraction study we show that the regular stepped surface is preserved during the initial exposure of 10⁻⁶ mbar of oxygen at 540 K while the formation of large (110) facets is observed during the annealing process. Thereby the faceting is induced by the ordering of the alumina. In addition, the preferential oxide growth of one out of two possible twin domains is found, probably caused by stress relief at the step edges of the vicinal surface.