Dresden 2009 – scientific programme
Parts | Days | Selection | Search | Downloads | Help
O: Fachverband Oberflächenphysik
O 66: Organic, polymeric, biomolecular films – also with absorbates II
O 66.2: Talk
Friday, March 27, 2009, 11:30–11:45, SCH A316
Photothermal fabrication of nanopatterned thiol-based organic monolayers on gold substrates — •Mareike Mathieu, Alice Hui, Eckart Hasselbrink, and Nils Hartmann — Fachbereich Chemie, Universität Duisburg-Essen and Center for Nanointegration Duisburg-Essen (CeNIDE), Universitätsstr. 5, 45141 Essen, Germany
In recent years nonlinear laser processing has been demonstrated as a facile means for nanopatterning of silane-based organic monolayers down to the sub 100 nm range [1,2]. Here we report on photothermal patterning of thiol-based monolayers. Gold-coated silicon substrates are functionalized with hexadecanethiol. Irradiation with a focused beam of an argon ion laser operated at a wavelength of 514 nm allows to locally remove the monolayer. Subsequently, the patterns are transferred into the gold film via selective etching in a ferri/ferrocyanide solution. Despite an 1/e2 spot diameter of about 2.5 µm, structures with lateral dimensions well below 500 nm are fabricated. The underlying nonlinear dependence of the patterning process on the laser intensity is traced back to the interplay between the laser-induced transient local temperature rise and the thermally activated desorption of the thiol molecules. A simple thermokinetic analysis of the data allows to estimate effective kinetic parameters of the patterning process. Respective values are in good agreement with data in the literature.
1. D. Dahlhaus, S. Franzka, E. Hasselbrink, N. Hartmann, Nano Lett. 6 (2006) 2358.
2. N. Hartmann, S. Franzka, J. Koch, B. N. Chichkov, A. Ostendorf, Appl. Phys. Lett. 92 (2008) 223111.